AMAT P5000
CVD & Etch
P5000
The Applied Materials P5000 is the most flexible, successful, single-wafer, multi-chamber CVD and etch system for manufacturing complex devices in high-volume production – optimized for compound semicoductor processing. As the licensed manufacturer of the P5000, SHELLBACK Semiconductor Technology provides remanufactured P5000 CVD and Etch systems, technical support, and software licensing as well as upgrades including chamber additions, upgrade kits, and enhancements.

Optimized for Compound Semiconductor Manufacturing
AMAT P5000
CVD & Dry Etch Systems
Process Applications
P5000 CVD
- Silane Oxide
- Silane Nitride
- Oxynitride
- TEOS Oxide
P5000 Etch
- Silicon Oxide
- Silicon Nitride
- Oxynitride RIE

Benefits:
- Proven reliability
- Better process control and repeatability = Higher Yield
- Enhanced factory automation support
- Reliable and production proven processes for dielectric etch & CVD
- Excellent value proposition for 75mm, 100mm, 150mm & 200mm
Features:
- 1 – 4 Chambers: Universal Lamp Heated CVD, MxP Etch, MxP+ Etch, eMxP, ASP Asher, Wafer Orienter
- Large install base of volume production tools
- Standard processes for silicon oxide and nitride
- Available 75 to 200 mm wafer transport
- Substrate Handling: 75mm – 200mm SiC, Sapphire, Quartz, Ge, GaAs, GaN, Silicon
- SHELLBACK Semiconductor Technology IP
- Bipolar Ceramic ESC
- Transparent Wafer
- Orienter GEMS Interface for Factory Automation