Semitool Torrent Spray Ozone Tool (SOT)
SHELLBACK’s Semitool Torrent Spray Acid Tool (SOT) is the world’s most advanced spray batch tool for semiconductor wet etch and cleans processes and comes in two models: The ECO-Clean and The ECO-Strip systems. The Torrent ECO-Clean, with Teflon chamber/rotor, delivers Hydrozone and Hydrozone+, Fluorozone and Fluorozone+ processes. The ECO-Strip, with a stainless steel chamber, delivers Hydrozone and Hydrozone+ processes. With it’s small footprint, both models have a 50-wafer load, an integral Ozone generator, and the most space efficient form-factor of any batch spray or immersion tool in the industry today.
Semitool Torrent ECO-Clean Spray Batch Tool
Process Applications:
- Photoresist strip
- Polymer removal
- Post-Dice clean
- Organic clean
- Trench clean
- RCA clean
Award-winning Ozone Processes
- SC1, SC2, SPM, HF replacement
- HydrOzone
- HydrOzone+
- FluorOzone
- FluorOzone+
Features:
Chamber
- Enhanced Spray Technology
- On-Axis design
- Uniform boundary layer
- Uniform, repeatable process
- High throughput
- Single chamber 25 or 50 wafer loads
- Dual chamber 25 or 50 wafer loads
- Sealed chamber isolates operator from chemistry
- Safe operation
Controlled injection of chemicals
- Fill vessels deliver dilute chemical
- NH4OH, HCL, HF
Software
- Windows 10
- Web based HMI
- Recipe Editor: Excel View & Remote upload
- SEC/GEM
- Smart Parts: Advanced predictive analytics
Dramatic cost of ownership reduction
- Zero to 7ml chemical consumption/run
- Reduce DIW consumption up to 85%
- Low exhaust and facilities requirements
- Low waste
- Reduces cost per wafer
- Improved cycle times
Semitool Torrent ECO-Strip Spray Batch Tool
Process Applications:
- Photoresist strip
- Polymer removal
- Post-Dice clean
- Organic clean
Award-winning Ozone Processes
- SC1, SPM replacement
- HydrOzone
- HydrOzone+
Features:
Chamber
- Enhanced Spray Technology
- On-Axis design
- Uniform boundary layer
- Uniform, repeatable process
- High throughput
- Single chamber 25 or 50 wafer loads
- Dual chamber 25 or 50 wafer loads
- Sealed chamber isolates operator from chemistry
- Safe operation
Controlled injection of chemicals
- Fill vessels deliver dilute chemical
- NH4OH
Software
- Windows 10
- Web based HMI
- Recipe Editor: Excel View & Remote upload
- SEC/GEM
- Smart Parts: Advanced predictive analytics
Dramatic cost of ownership reduction
- Zero to 7ml chemical consumption/run
- Reduce DIW consumption up to 85%
- Low exhaust and facilities requirements
- Low waste
- Reduces cost per wafer
- Improved cycle times