SEMITOOL TORRENT
Spray Acid Tool
SAT
MERCURY+
Acquisition!
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Click Here for
Hi Speed
Clean Etch
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Click Here for
Hi Speed
Clean Etch
SHELLBACK’s SEMITOOL TORRENT Spray Acid Tool (SAT) is the world’s most advanced spray batch tool for semiconductor wet etch and cleans processes. Featuring proprietary independent flow control nozzles, wafer-to-wafer repeatability, sealed PVDF tanks, Smart Parts intelligence, and more, the Torrent defines the new normal in wet wafer processing applications for semiconductor manufacturing, advanced packaging, optoelectronics, MEMS and compound semiconductors.
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SEMITOOL TORRENT Spray Acid Tool (SAT)
Batch Spray System
Process Applications
- Post etch clean
- Pre diffusion clean
- Post CMP clean
- Post ash clean
- UBM etch
- Metal etch
- BOE etch
- Oxide etch
- GaAs etch & clean
- Cu etch
- RDL etch
- Glass etch
- Wafer thinning
- Si etch
Cost of Ownership
- Low exhaust and facilities requirements
- Low chemical consumption
- Low DIW consumption
- Low waste
Features:
Chamber
- Enhanced Spray Technology™
- On-Axis design
- Uniform boundary layer
- Uniform, repeatable process
- Flexible process
- High throughput
- Single chamber 25 or 50 wafer loads
- Dual chamber 25 or 50 wafer loads
- End point detection available
- Sealed chamber isolates operator from chemistry
- Safe operation
Tanks
- Single chamber up to 4 tanks (40l) 6 tanks (20l)
- Dual chamber up to 8 tanks
- 20 liter or 40 liter tanks available
- Chemical concentration monitoring available
- Sealed welded tanks prevent chemical leakage
- Fill Vessels available for tank spiking
Software
- Windows 10
- Web based HMI
- Recipe Editor: Excel View & Remote upload
- SEC/GEM
- Smart Parts: Advanced predictive analytics