SEMITOOL
Spin Rinse Dryer
SRD
SHELLBACK introduces the next-generation SEMITOOL Spin Rinse Dryer (SRD) with advanced controls that enhance ease-of-use, improves monitoring and management capabilities, and reduces operating costs. The SEMITOOL IP was acquired in 2011 and SHELLBACK has continually added quality and reliability upgrades to its best-in-class SRD product the world standard for high-performance cleaning, rinsing, and drying with more than 25,000 units currently in use. A major engineering design upgrade of its Semitool Spin Rinse Dryer, a platform for removing residual chemicals from semiconductor substrates and other materials such as optical lenses. The new SRD800 series features several upgrades, including a robust Windows OS, advanced automation, an intuitive GUI, and patent-pending SmartParts™uptime technology. Along with improved ergonomic functionality, the many system upgrades enhance management capabilities and gives users the ability to track and control operations in real time in order to significantly reduce overall cost of ownership.
SEMITOOL SRD800 Spin Rinse Dryer (SRD)
Batch Spray System
Complete chemical and residue cleaning optimized for low particles and protection of substrates with innovative low cost of ownership.
- High Performance Chamber: Particle Guarantee <20 adders @ 0.2um per 8” wafer
- Multi Touch Graphical Control System: 10.1” touch screen with Windows 10 OS
- Smart Parts Software: OEM Group’s predictive maintenance software that monitors all components. Datalogging and graphing of motors, heaters, valves, solenoids and sensors. Access to manual, schematics and data sheets.
- High Resolution Internal Resolver Feedback Motor: Programmable acceleration and deceleration with stable low and high speed control 0 – 2800 RPM
- Configurable Thermal Profiling: Monitored and programmable bowl and N2 heating for optimal processing of substrates
- Visual and Audio Status Indication Bars: Chamber status seen and heard from a distance
- Programmable N2 Purge Saver: Saves up to 23 LPM in idle state. Save up to $8,000 a year.
- DIW Resistivity Monitor: Assures an automatic and reliable rinse to clean process
- ESD Wafer Protection: Removes static charge in chamber
- Programmable Auto Rinse: DIW chamber rinse to prevent stagnation and particle build-up
- SECS/GEM: Factory automation and remote data access